Title:
DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2021/185037
Kind Code:
A1
Abstract:
A display substrate and a manufacturing method therefor, and a display panel, which relate to the field of display technology. The display substrate comprises: a passivation layer (28) and a planarization layer (29) covering the passivation layer (28); the planarization layer (29) comprises a first planarization via hole and a plurality of second planarization via holes; the passivation layer (28) comprises a first passivation via hole; the first planarization via hole and the first passivation via hole form a first set of holes (31); the hole depth of the first planarization via hole is less than the hole depth of each of the second planarization via holes; and the hole depth of the first passivation via hole is greater than or equal to the difference between the maximum hole depth of all the second planarization via holes and the hole depth of the first planarization via hole.
Inventors:
CHENG LEILEI (CN)
HUANG YONGCHAO (CN)
WANG QINGHE (CN)
ZHANG YANG (CN)
ZHOU BIN (CN)
HUANG YONGCHAO (CN)
WANG QINGHE (CN)
ZHANG YANG (CN)
ZHOU BIN (CN)
Application Number:
PCT/CN2021/077695
Publication Date:
September 23, 2021
Filing Date:
February 24, 2021
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L27/12
Foreign References:
| CN102141710A | 2011-08-03 | |||
| CN106876411A | 2017-06-20 | |||
| US20040263742A1 | 2004-12-30 | |||
| US20050253171A1 | 2005-11-17 |
Attorney, Agent or Firm:
BEIJING RUN ZEHENG INTELLECTUAL PROPERTY LAW FIRM (CN)
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