Title:
DRAWING DEVICE CONTROL METHOD AND DRAWING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/090082
Kind Code:
A1
Abstract:
[Problem] To provide a drawing device control method and a drawing device which enable suppression of the influence of scattered beams on a drawing process. [Solution] A drawing device according to an embodiment of the present invention is for drawing a prescribed pattern on an irradiation object by irradiating a prescribed position of the irradiation object with multiple charged particle beams, and comprises: a beam generation mechanism for generating multiple charged particle beams; a blanking aperture mechanism which is provided with a limit aperture substrate for blocking the generated multiple charged particle beams and a deflector for deflecting the multiple charged particle beams in a prescribed direction and which blanks the multiple charged particle beams; a stage on which the irradiation object is placed and which is movable; a driving unit that moves the limit aperture substrate; and a control unit that controls the drawing device. The control unit causes the limit aperture substrate to move, during a blanking period, within a plane perpendicular to the axial direction of the multiple charged particle beams from a layout position thereof for drawing, and to return to the layout position at the time of drawing.
Inventors:
FUJISAKI EITA (JP)
NAKAYAMA TAKAHITO (JP)
NAKAHASHI SATOSHI (JP)
NAKAYAMA TAKAHITO (JP)
NAKAHASHI SATOSHI (JP)
Application Number:
PCT/JP2022/039796
Publication Date:
May 25, 2023
Filing Date:
October 25, 2022
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/09; G03F7/20; H01J37/147; H01J37/305; H01L21/027
Foreign References:
| JP2018078187A | 2018-05-17 | |||
| JP2010067809A | 2010-03-25 | |||
| JP2010074112A | 2010-04-02 | |||
| JP2006245176A | 2006-09-14 |
Attorney, Agent or Firm:
MIYAJIMA Manabu et al. (JP)
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