Title:
DRY BIOFILM TREATMENT AGENT, CLEANING COMPOSITION FOR MEDICAL DEVICES, AND METHOD FOR TREATING DRY BIOFILM
Document Type and Number:
WIPO Patent Application WO/2024/089991
Kind Code:
A1
Abstract:
[Problem] The present invention provides: a treatment agent having excellent dry biofilm removal capability and excellent biofilm reformation-preventing properties; a cleaning composition for medical devices, which contains the treatment agent; and a dry biofilm treatment method using the treatment agent or the cleaning composition. [Solution] Provided are: a dry biofilm treatment agent which is characterized by containing the components (a) or (b) mentioned below as essential ingredients and being used at a concentration range lower than a MIC (minimum inhibitory concentration); a cleaning composition for medical devices, which contains the treatment agent; and a dry biofilm treatment method using the dry biofilm treatment agent or the cleaning composition: (a): an anthranilic acid and a dialkyl sulfosuccinic acid salt; and (b): aromatic monoalcohol and a dialkyl sulfosuccinic acid salt.
Inventors:
KUBO TAKESHI (JP)
IGARASHI RYOJI (JP)
IGARASHI RYOJI (JP)
Application Number:
PCT/JP2023/030412
Publication Date:
May 02, 2024
Filing Date:
August 24, 2023
Export Citation:
Assignee:
SEIKO PMC CORP (JP)
International Classes:
A01N37/44; A01N31/04; A01N41/04; A01P3/00
Domestic Patent References:
WO2021005897A1 | 2021-01-14 | |||
WO2016068230A1 | 2016-05-06 | |||
WO2009069296A1 | 2009-06-04 |
Foreign References:
JP2017190312A | 2017-10-19 | |||
JP2006512197A | 2006-04-13 |
Attorney, Agent or Firm:
TSUTA Yasuhiro (JP)
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