Title:
DRYING APPARATUS AND DRYING METHOD
Document Type and Number:
WIPO Patent Application WO/2014/192668
Kind Code:
A1
Abstract:
The present invention suppresses a decrease in condensation drying efficiency, and reduces the failure of a coating film. A drying apparatus (1) is provided with a condenser plate (11) facing a coating film of a substrate (f1), and dries said coating film by condensing solvent vapor from the coating film using the condenser plate (11). The coating film contains a silicon compound that produces silane gas, and is provided with a flat recovery member (13), which is positioned so as to face the coating film on the substrate (f1), as a recovery means for recovering the silane gas produced from the coating film before the condenser plate (11) dries.
Inventors:
KURAKATA SHINICHI (JP)
HIROSE TATSUYA (JP)
HIROSE TATSUYA (JP)
Application Number:
PCT/JP2014/063773
Publication Date:
December 04, 2014
Filing Date:
May 26, 2014
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
F26B13/04
Foreign References:
| JP2008137002A | 2008-06-19 | |||
| JP2011025244A | 2011-02-10 | |||
| JP2007276283A | 2007-10-25 |
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
Patent business corporation Mitsuaki international patent firm (JP)
Patent business corporation Mitsuaki international patent firm (JP)
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