Title:
DUAL-LAYER ALIGNMENT DEVICE AND METHOD
Document Type and Number:
WIPO Patent Application WO/2017/186170
Kind Code:
A1
Abstract:
A dual-layer alignment device comprises a fixing frame (40); a first measurement device (50) and a marking board (41) disposed on the fixing frame (40), wherein a fixed frame mark (20) is configured on the marking board (41); and a movable platform (60) and a reference mark (30), a movable platform mark (70), and a second measurement device (10) configured on the movable platform (60). The first measurement device (50) is configured to measure a relative location relationship between the reference mark (30) and the movable platform mark (70). The second measurement device (10) is configured to measure a relative location relationship between the reference mark (30) and the fixed frame mark (20), so as to obtain a final relative location relationship between the movable platform mark (70) and the fixed frame mark (20). The movable platform (60) is moved according to the final relative location relationship to a configured location. A dual-layer alignment method is provided correspondingly. The movable platform is the only movable component in the system, and employs a static marking method to implement marking a coordinate relationship, and therefore, marking precision is unaffected by positioning precision of the movable platform (60), and consequently, alignment precision can be increased. The embodiment can employ a dual-lens or multi-lens design, providing flexible configurations and increasing the alignment precision.
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Inventors:
ZHOU XUCHAO (CN)
PAN LIANDONG (CN)
ZHU SHUCUN (CN)
PAN LIANDONG (CN)
ZHU SHUCUN (CN)
Application Number:
PCT/CN2017/082493
Publication Date:
November 02, 2017
Filing Date:
April 28, 2017
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD (CN)
International Classes:
G03F9/00; G03F7/20
Foreign References:
CN1794096A | 2006-06-28 | |||
CN1794097A | 2006-06-28 | |||
CN101021694A | 2007-08-22 | |||
CN101158818A | 2008-04-09 | |||
US6642995B2 | 2003-11-04 | |||
US20090251699A1 | 2009-10-08 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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