Title:
DYE-CONTAINING RESIST COMPOSITION CONTAINING PHOTOACID GENERATOR, AND CYCLOHEXADIENE-TYPE OXIME SULFONATE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2008/032736
Kind Code:
A1
Abstract:
[PROBLEMS] To provide a dye-containing resist composition which can provide
a color filter suppressed in the coloration at the visible region (400 to 730 nm).
[MEANS FOR SOLVING PROBLEMS] A dye-containing resist composition containing
a photoacid generator comprising a cyclohexadiene-type oxime sulfonate compound
represented by the formula [1]. [1] wherein R1, R2, R5,
R6 and R7 independently represent a hydrogen atom, a halogen
atom, CN, NO2, an alkyl group having 1 to 10 carbon atoms, an alkoxy group
having 1 to 5 carbon atoms, or the like; R3 represents a hydrogen atom,
a halogen atom, a nitro group, a CN group, an alkyl group having 1 to 10 carbon atoms,
an alkoxy group having 1 to 5 carbon atoms, or the like; R4 represents
an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 5 carbon atoms,
a haloalkyl group having 1 to 5 carbon atoms, a haloalkoxy group having 1 to 5 carbon
atoms, a phenyl group which may be substituted by W, or the like; and W represents
a halogen atom, CN, an alkyl group having 1 to 10 carbon atoms, or the like; and n
represents an integer of 1, 2, 3 or 4.
Inventors:
SUZUKI HIDEO (JP)
MIYAZAWA TOMOE (JP)
KIKUCHI TAKAMASA (JP)
MIYAZAWA TOMOE (JP)
KIKUCHI TAKAMASA (JP)
Application Number:
PCT/JP2007/067726
Publication Date:
March 20, 2008
Filing Date:
September 12, 2007
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
SUZUKI HIDEO (JP)
MIYAZAWA TOMOE (JP)
KIKUCHI TAKAMASA (JP)
SUZUKI HIDEO (JP)
MIYAZAWA TOMOE (JP)
KIKUCHI TAKAMASA (JP)
International Classes:
G03F7/004; C07C255/64; C07C309/65; C07C309/73; G02B5/20; G03F7/039
Domestic Patent References:
| WO1999001429A1 | 1999-01-14 | |||
| WO2006046398A1 | 2006-05-04 |
Foreign References:
| JP2004133393A | 2004-04-30 | |||
| JP2006133508A | 2006-05-25 |
Other References:
KOJI ISHIZU; AKIHIDE MORI, MACROMOL. RAPID COMMUN., vol. 21, 2000, pages 665 - 668
KOJI ISHIZU; AKIHIDE MORI, POLYMER INTERNATIONAL, vol. 50, 2001, pages 906 - 910
KOJI ISHIZU; YOSHIHIRO OHTA; SUSUMU KAWAUCHI, MACROMOLECULES, vol. 35, no. 9, 2002, pages 3781 - 3784
KOJI ISHIZU; TAKESHI SHIBUYA; AKIHIDE MORI, POLYMER INTERNATIONAL, vol. 51, 2002, pages 424 - 428
KOJI ISHIZU; TAKESHI SHIBUYA; SUSUMU KAWAUCHI, MACROMOLECULES, vol. 36, no. 10, 2002, pages 3505 - 3510
KOJI ISHIZU ET AL., POLYMER INTERNATIONAL, vol. 53, 2004, pages 259 - 265
MACROMOL. RAPID COMMUN., vol. 21, 2000, pages 665 - 668
POLYMER INTERNATIONAL, vol. 51, 2002, pages 424 - 428
KOJI ISHIZU; AKIHIDE MORI, POLYMER INTERNATIONAL, vol. 50, 2001, pages 906 - 910
KOJI ISHIZU; YOSHIHIRO OHTA; SUSUMU KAWAUCHI, MACROMOLECULES, vol. 35, no. 9, 2002, pages 3781 - 3784
KOJI ISHIZU; TAKESHI SHIBUYA; AKIHIDE MORI, POLYMER INTERNATIONAL, vol. 51, 2002, pages 424 - 428
KOJI ISHIZU; TAKESHI SHIBUYA; SUSUMU KAWAUCHI, MACROMOLECULES, vol. 36, no. 10, 2002, pages 3505 - 3510
KOJI ISHIZU ET AL., POLYMER INTERNATIONAL, vol. 53, 2004, pages 259 - 265
MACROMOL. RAPID COMMUN., vol. 21, 2000, pages 665 - 668
POLYMER INTERNATIONAL, vol. 51, 2002, pages 424 - 428
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (Shin-Ochanomizu Urban Trinity2, Kandasurugadai 3-chome, Chiyoda-ku Tokyo 62, JP)
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