Title:
ELECTROLYTE COMPOSITION CONTAINING METALS AND SILICON IN PLASMA ELECTROLYTIC OXIDATION PROCESS AND METHOD FOR MANUFACTURING DENTAL IMPLANTS COATED WITH HYDROXYAPATITE AND CONTAINING METAL IONS AND SILICON IONS BY USING SAME COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/174475
Kind Code:
A1
Abstract:
The present invention relates to formation of a porous oxide film, by means of plasma electrolytic oxidation, on the surface of a titanium-based alloy which is a metallic material that is generally used by being inserted into bones in a human body. More specifically, the present invention relates to a method for manufacturing implants for improving bioactivity by forming, by means of plasma electrolytic oxidation, a surface of a porous oxide film containing metal ions, silicon ions, calcium and phosphorus on the surface of dental implants, by using an electrolyte solution containing, from among plenty of ions constituting a human body, metals (magnesium, zinc, strontium, manganese) and silicon that play an important role in the cell adhesion and bone formation. In addition, the present invention relates to an electrolyte composition containing metals and silicon in a plasma electrolytic oxidation process and a method for manufacturing dental implants coated with hydroxyapatite and containing metal ions and silicon ions by using the composition, wherein the plasma electrolytic oxidation process comprises: a titanium alloy preparation step of sequentially subjecting a dental titanium alloy to grinding, micro-grinding, and ultrasonic cleaning; an insertion step of installing the titanium alloy prepared in the preparation step on an anode of an electrolysis tank, installing platinum on a cathode thereof, and inserting an electrolyte solution; a plasma forming step of forming an oxide film on the titanium alloy by generating plasma by applying constant voltage and current density; and a drying step of, after the oxide film is formed on the titanium alloy in the plasma forming step, cleaning the same with ethanol and distilled water, and then drying the same. The electrolyte composition containing metals and silicon in the plasma electrolytic oxidation process and the method for manufacturing dental implants coated with hydroxyapatite and containing metal ions and silicon ions by using the composition have the effect of simplifying steps of a manufacturing process and reducing time for manufacturing implants and a therapeutic period by treating the surface of the dental implants by employing the plasma electrolytic oxidation process in a titanium-based bio-alloy. Also, a porous oxide film having biocompatibility has been generated through complex substitution of metal ions and silicon ions using plasma electrolytic oxidation, an oxide film that is thicker and denser than conventional metal oxide films is manufactured, and the biocompatibility is rapidly increased by containing bioactive materials of metal ions and silicon ions, thereby enhancing the initial fixing force of the dental implants and reducing the therapeutic period.
Inventors:
CHOI HAN-CHEOL (KR)
PARK SEON-YOUNG (KR)
HWANG IN-JO (KR)
YU JI-MIN (KR)
KANG JEONG-IN (KR)
PARK SEON-YOUNG (KR)
HWANG IN-JO (KR)
YU JI-MIN (KR)
KANG JEONG-IN (KR)
Application Number:
PCT/KR2018/003089
Publication Date:
September 27, 2018
Filing Date:
March 16, 2018
Export Citation:
Assignee:
UNIV CHOSUN IACF (KR)
International Classes:
A61C13/00; A61C8/00; A61K6/04; A61K6/838; A61L27/06; A61L27/32
Foreign References:
| CN106245094A | 2016-12-21 | |||
| CN103911644A | 2014-07-09 | |||
| CN106086993A | 2016-11-09 | |||
| JPH119679A | 1999-01-19 | |||
| CN103386148A | 2013-11-13 | |||
| KR101835623B1 | 2018-03-07 | |||
| KR101835684B1 | 2018-03-07 |
Attorney, Agent or Firm:
GO, Young-Su (KR)
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