Title:
ELECTROMAGNETIC RADIATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2021/053168
Kind Code:
A3
Abstract:
An electromagnetic radiation system for directing an electromagnetic radiation beam (11) at a target (28) having a first arrangement (12) in which the radiation beam (11) is directed along a marking beam path that is within a marking range of the electromagnetic radiation system and a second arrangement (12, 15) in which the radiation beam (27) is directed along a different beam path (27) that is not within the marking range of the electromagnetic radiation system, wherein a positional relationship between the marking beam path (11) and the different beam path (27) satisfies a predetermined condition at the target (28) when the electromagnetic radiation system is at a predetermined distance (29) from the target (28).
Inventors:
KUECKENDAHL PETER (DE)
SEUTHE CHRISTIAN (DE)
SEUTHE CHRISTIAN (DE)
Application Number:
PCT/EP2020/076149
Publication Date:
July 08, 2021
Filing Date:
September 18, 2020
Export Citation:
Assignee:
ALLTEC ANGEWANDTE LASERLICHT TECH GMBH (DE)
International Classes:
B23K26/082; B23K26/04; B23K26/046; B23K26/352; B23K26/359; B23K26/362; G02B26/10
Foreign References:
CN201371313Y | 2009-12-30 | |||
DE102004027621A1 | 2006-01-12 | |||
US20080023455A1 | 2008-01-31 | |||
US20080210886A1 | 2008-09-04 | |||
CN206764138U | 2017-12-19 | |||
CN109954968A | 2019-07-02 | |||
US20180369964A1 | 2018-12-27 | |||
JP2006326603A | 2006-12-07 | |||
JP2008290137A | 2008-12-04 | |||
JP2004029109A | 2004-01-29 | |||
US9366860B1 | 2016-06-14 | |||
JPH0731119A | 1995-01-31 |
Attorney, Agent or Firm:
MARKS & CLERK LLP (GB)
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