Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/070010
Kind Code:
A1
Abstract:
Provided is an electron beam apparatus with which it is possible to stably achieve a high spatial resolution even in a case in which low-acceleration observation is performed by using CeB6 in a CFE electron source. In an electron beam apparatus provided with a CFE electron source (929): a section of the CFE electron source from which an electron beam (931) is emitted is formed of a Ce hexaboride product or a hexaboride product of a lanthanoid metal that is heavier than Ce; the hexaboride product emits the electron beam from a {310}-surface thereof; and the number of atoms of the lanthanoid metal in the {310}-surface is set to be greater than the number of boron molecules formed of six boron atoms in the {310}-surface.

More Like This:
JPH04129145ELECTRON MICROSCOPE
JP2002298775SHORT PULSE ELECTRON BEAM GENERATING DEVICE AND SMALL- SIZED PULSE ELECTRON SPECTROSCOPIC ANALYZING DEVICE
JPS6019108[Title of the Invention] Electric field radiation scanning electron microscope
Inventors:
KASUYA KEIGO (JP)
ARAI NORIAKI (JP)
KUSUNOKI TOSHIAKI (JP)
OHSHIMA TAKASHI (JP)
HASHIZUME TOMIHIRO (JP)
SAKAI YUSUKE (JP)
Application Number:
PCT/JP2016/080357
Publication Date:
April 19, 2018
Filing Date:
October 13, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/073; H01J1/30; H01J9/02
Domestic Patent References:
WO2014007121A12014-01-09
Foreign References:
JPH03274642A1991-12-05
JPH1031955A1998-02-03
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: HEAT PUMP APPARATUS

Next Patent: JOB SPECIFICATION PROGRAM, JOB SPECIFICATION METHOD AND JOB SPECIFICATION DEVICE