Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM APPLICATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/157809
Kind Code:
A1
Abstract:
The present invention achieves a high resolution even in the case of using a light-excited electron source as an electron source in a scanning electron beam application device that two-dimensionally scans an electron beam on a sample. Accordingly, this electron beam application device has: a photocathode (1) having a substrate (11) having a refractive index exceeding 1.7 and a photoelectric film (10); a converging lens (2) for converging excitation light on the photocathode; an extraction electrode (3) disposed facing the photocathode and accelerating the electron beam generated from the photoelectric film of the photocathode in such a way that the excitation light is converged by the converging lens, transmits the substrate of the photocathode, and is made to be incident; and an electron optical system including a deflector (25) for two-dimensionally scanning the electron beam accelerated by the extraction electrode on a sample. In the electron beam application device, the spherical aberration of the converging lens is set such that the root-mean-square of the spherical aberration is less or equal to 1/14 of the wavelength of the excitation light on the photoelectric film.

Inventors:
OHSHIMA TAKASHI (JP)
IDE TATSURO (JP)
MORISHITA HIDEO (JP)
OSE YOICHI (JP)
NOMAGUCHI TSUNENORI (JP)
AGEMURA TOSHIHIDE (JP)
Application Number:
PCT/JP2019/002803
Publication Date:
August 06, 2020
Filing Date:
January 28, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI HIGH-TECH CORP (JP)
International Classes:
H01J1/34; H01J37/073
Domestic Patent References:
WO2017168554A12017-10-05
Foreign References:
JP2017054954A2017-03-16
JP2003303565A2003-10-24
JPH1020198A1998-01-23
US20180337017A12018-11-22
US20190013176A12019-01-10
Other References:
IZUMITANI,TETSURO.: "High Precision Moulding of Aspherical Glass Lenses", JOURNAL OF THE JAPAN SOCIETY OF PRECISION ENGINEERING, vol. 55, no. 6, 5 June 1989 (1989-06-05), JP, pages 972 - 975, XP009522780, ISSN: 0912-0289, DOI: 10.2493/jjspe.55.972
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
Download PDF: