Title:
ELECTRON BEAM DEPOSITION DEVICE AND THIN FILM FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/052246
Kind Code:
A1
Abstract:
This electron beam deposition device (100) is provided with: a crucible (14) into which a deposition material is charged; an electron gun (16) for producing an electron beam (20) incident on the deposition material; a magnetic field producing unit (30); and a magnetic shield (40). The magnetic field producing unit (30) produces a first magnetic field (B1) for deflecting electrons reflected from the deposition material. The magnetic shield (40) blocks the first magnetic field (B1) to prevent the first magnetic field (B1) from affecting the path of the electron beam (20).
Inventors:
SUGIMOTO YUICHI (JP)
ADACHI NAOYA (JP)
SEKI HITOSHI (JP)
ADACHI NAOYA (JP)
SEKI HITOSHI (JP)
Application Number:
PCT/JP2015/076609
Publication Date:
April 07, 2016
Filing Date:
September 18, 2015
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
International Classes:
C23C14/30
Foreign References:
| JPH0481960U | 1992-07-16 | |||
| JP2013170272A | 2013-09-02 | |||
| JP2012112002A | 2012-06-14 | |||
| JP2000306665A | 2000-11-02 | |||
| JP2015030862A | 2015-02-16 |
Attorney, Agent or Firm:
Fukami Patent Office, p. c. (JP)
Patent business corporation Fukami patent firm (JP)
Patent business corporation Fukami patent firm (JP)
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