Title:
ELECTRON BEAM DEVICE EQUIPPED WITH ORBITRON PUMP, AND ELECTRON BEAM RADIATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2015/115000
Kind Code:
A1
Abstract:
Having such objective as preventing beam blurring from occurring for a primary electron beam (203) to remedy beam instability in an electron beam device equipped with an orbitron pump (120), the present invention relates to bringing the electric potential of an extraction electrode (201), which extracts the electron beam (203) from an electron source (200), to lower than the electric potential of the orbitron pump (120) filament (101), or the like, when the vacuum container holding the electron source (200) is being evacuated by the orbitron pump (120). According to the present invention, no electrons from the filament (101), or the like, leak out of the orbitron pump (120) and reach the extraction electrode (201). This prevents beam blurring from occurring for the primary electron beam (203) and remedies beam instability.
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Inventors:
KANEDA MINORU (JP)
ITO HIROYUKI (JP)
MURAKOSHI HISAYA (JP)
ITO HIROYUKI (JP)
MURAKOSHI HISAYA (JP)
Application Number:
PCT/JP2014/084017
Publication Date:
August 06, 2015
Filing Date:
December 24, 2014
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/18
Domestic Patent References:
| WO2010146833A1 | 2010-12-23 |
Foreign References:
| JPH07254388A | 1995-10-03 | |||
| US3407991A | 1968-10-29 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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