Title:
ELECTRON BEAM DEVICE AND IMAGE FORMING DEVICE
Document Type and Number:
WIPO Patent Application WO/2000/051158
Kind Code:
A1
Abstract:
An electron beam device having an airtight container, an electron source provided in the container and a spacer (1), characterized in that the spacer (1) has at least an area (4) where a fine particle-containing layer exists, a sheet resistance of the spacer as measured on the surface of the area is 10?7¿ $g(V)/$m(c) or higher, and the fine particles have an average grain size of up to 1000Å and contain at least metal elements. The electron beam device delivers an excellent display quality minimized in luminous point displacement and in creeping discharge, and an extended reliability.
Inventors:
ITO NOBUHIRO (JP)
Application Number:
PCT/JP2000/001047
Publication Date:
August 31, 2000
Filing Date:
February 24, 2000
Export Citation:
Assignee:
CANON KK (JP)
ITO NOBUHIRO (JP)
ITO NOBUHIRO (JP)
International Classes:
H01J29/02; H01J29/86; H01J31/12; (IPC1-7): H01J29/87; H01J31/12
Foreign References:
| JP2000021334A | 2000-01-21 | |||
| JPH10284285A | 1998-10-23 | |||
| JPH10302684A | 1998-11-13 | |||
| JPH10326583A | 1998-12-08 |
Attorney, Agent or Firm:
Kaneda, Nobuyuki (16th Kowa Bldg. 9-20 Akasaka 1-chome Minato-ku, Tokyo, JP)
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