ELECTRON BEAM DEVICE

Title:

ELECTRON BEAM DEVICE

Document Type and Number:

WIPO Patent Application WO/2005/069345

Kind Code:

A1

Abstract:

An electron device capable of evaluating a sample at high throughput and high S/N. An electron beam emitted from an electron gun is irradiated, through an electrostatic lens (4-1), an objective lens (11-1), etc., in a diagonal direction on a sample (W) placed on an X-Y-Ѳ stage (9-1), and secondary electrons or reflected electrons are discharged from the sample (W). The incident angle of the primary electron beam is set to about not less than 35º and less than 90º by controlling a polarizer (8-1). The electrons discharged from the sample (W) are guided in the vertical direction to form an image on a detector.

Inventors:

WATANABE KENJI (JP)
SATAKE TOHRU (JP)
NAKASUJI MAMORU (JP)
MURAKAMI TAKESHI (JP)
KARIMATA TSUTOMU (JP)
NOJI NOBUHARU (JP)
TOHYAMA KEIICHI (JP)
HATAKEYAMA MASAHIRO (JP)

Application Number:

PCT/JP2004/017463

Publication Date:

July 28, 2005

Filing Date:

November 25, 2004

Export Citation:

Click for automatic bibliography generation Help

Assignee:

EBARA CORP (JP)
WATANABE KENJI (JP)
SATAKE TOHRU (JP)
NAKASUJI MAMORU (JP)
MURAKAMI TAKESHI (JP)
KARIMATA TSUTOMU (JP)
NOJI NOBUHARU (JP)
TOHYAMA KEIICHI (JP)
HATAKEYAMA MASAHIRO (JP)

International Classes:

H01L21/66; H01J37/073; H01J37/12; H01J37/147; H01J37/26; H01J37/29; (IPC1-7): H01J37/29; H01J37/073; H01J37/12; H01J37/147; H01L21/66

Foreign References:

JP2003173756A	2003-06-20
JP2003297278A	2003-10-17
JPH0582063A	1993-04-02
JP2003532274A	2003-10-28
JP2002231170A	2002-08-16

Other References: