Title:
ELECTRON BEAM MONITORING DEVICE AND ELECTRON BEAM IRRADIATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/062871
Kind Code:
A1
Abstract:
According to the present invention, in an electron beam irradiation system comprising an electron beam irradiation device that irradiates an electron beam onto an irradiated object through an emission window, an electron beam monitoring device monitors the electron beam. The electron beam monitoring device comprises: a first X-ray detection unit that has a detection surface facing between the emission window and the irradiated object, and that detects an X-ray; and a second X-ray detection unit that is opposed to the emission window and that detects one-dimensional distribution or two-dimensional distribution of the X-ray.
Inventors:
MATSUI SHINJIRO (JP)
Application Number:
PCT/JP2022/023485
Publication Date:
April 20, 2023
Filing Date:
June 10, 2022
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G21K5/04
Foreign References:
| JP2007010533A | 2007-01-18 | |||
| JP2004361195A | 2004-12-24 | |||
| JP2011099839A | 2011-05-19 | |||
| JP2013053924A | 2013-03-21 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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