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Patent Searching and Data


Title:
ELECTRON BEAM PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/074104
Kind Code:
A1
Abstract:
This electron beam processing device (1000) comprises an electron beam generation source (600), a radiation control unit (700) for controlling the radiation direction of the electron beam, and an electron beam passage unit (800) for enabling the electron beam to be transmitted through a transmission window, and has a rotation member (opening part casing (60)) that maintains the reduced pressure of the electron beam passage unit (800), faces the electron beam generation source (600), and is capable of rotating while remaining airtight. A plurality of the transmission windows (200) are provided in the rotation member, and the shape thereof is linear. The transmission windows (200) are arranged in the circumferential direction of the rotation member, and the lengthwise direction of each transmission window is formed substantially in the radial direction. The radiation control unit (700) scans the electron beam in the lengthwise direction of a transmission window (200) while moving the transmission window by rotating the rotation member.

Inventors:
ICHIMURA SATOSHI (JP)
KOJIMA HIROAKI (JP)
SUTO TETSUYA (JP)
ITO MAKOTO (JP)
Application Number:
PCT/JP2022/032107
Publication Date:
May 04, 2023
Filing Date:
August 25, 2022
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
B23K15/00; G21K5/00; G21K5/04
Domestic Patent References:
WO2005055269A22005-06-16
Foreign References:
JP2002181999A2002-06-26
JPH04230900A1992-08-19
JP2002139600A2002-05-17
JP2000249800A2000-09-14
JPH04164300A1992-06-09
Attorney, Agent or Firm:
ISONO INTERNATIONAL PATENT OFFICE, P.C. (JP)
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