Title:
ELECTRON GUN, ELECTRON BEAM APPLICATION DEVICE, AND METHOD FOR FORMING MULTI-ELECTRON BEAM
Document Type and Number:
WIPO Patent Application WO/2023/085133
Kind Code:
A1
Abstract:
[Problem] To provide an electron gun capable of forming a larger number of electron beams than the number of lenses of a multi-lens array, an electron beam application device, and a method for forming a multi-electron beam. The problem is solved by an electron gun comprising: an electron generation source which generates electrons that can be emitted; an anode which can form an electric field with the electron generation source, draws out the electrons that can be emitted by the formed electric field, and forms an electron beam; and a multi-lens array, wherein, when an electron beam with which the multi-lens array is irradiated is defined as a first electron beam, m (m is any integer of 2 or more) first electron beams are formed, and the multi-lens array is provided with n (n is any integer of 2 or more) lenses, and when an electron beam emitted from the multi-lens array is defined as a second electron beam, up to m×n second electron beams can be formed.
Inventors:
IIJIMA HOKUTO (JP)
Application Number:
PCT/JP2022/040542
Publication Date:
May 19, 2023
Filing Date:
October 28, 2022
Export Citation:
Assignee:
PHOTO ELECTRON SOUL INC (JP)
International Classes:
H01J37/06; H01J1/34; H01J37/073; H01J37/28
Foreign References:
| JP2017108146A | 2017-06-15 | |||
| JP2016522572A | 2016-07-28 | |||
| JP2013544031A | 2013-12-09 | |||
| US20200126751A1 | 2020-04-23 |
Attorney, Agent or Firm:
MATSUMOTO Seiji (JP)
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