Title:
ELECTRON SOURCE, ELECTRON BEAM DEVICE, AND METHOD FOR MANUFACTURING ELECTRON SOURCE
Document Type and Number:
WIPO Patent Application WO/2021/130837
Kind Code:
A1
Abstract:
In a thermal field emission electron source or a Schottky emission electron source using a hexaboride single crystal according to the present invention, side emission from parts other than an electron emission part is reduced. An electron source according to the present invention is characterized by being provided with: a projection part (40) that emits electrons when an electrical field is generated; a shank (41) that supports the projection part (40) and has a diameter decreasing toward the projection part (40); and a trunk part (42) that supports the shank (41). The projection part (40), the shank (41), and the trunk (42) each comprise a hexaboride single crystal, and parts of the shank (41) and the trunk (42) excluding the projection part (40) are covered with materials higher in work function than the hexaboride single crystal.
Inventors:
KUSUNOKI TOSHIAKI (JP)
HASHIZUME TOMIHIRO (JP)
ARAI NORIAKI (JP)
KASUYA KEIGO (JP)
HASHIZUME TOMIHIRO (JP)
ARAI NORIAKI (JP)
KASUYA KEIGO (JP)
Application Number:
PCT/JP2019/050481
Publication Date:
July 01, 2021
Filing Date:
December 24, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/06
Domestic Patent References:
| WO2008120412A1 | 2008-10-09 |
Foreign References:
| JPS6147038A | 1986-03-07 | |||
| JP2000173900A | 2000-06-23 | |||
| JP2019525401A | 2019-09-05 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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