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Title:
ELECTRONIC APPROVAL SYSTEM, ELECTRONIC APPROVAL SERVER, ELECTRONIC APPROVAL PROGRAM, AND COMPUTER-READABLE STORAGE MEDIUM
Document Type and Number:
WIPO Patent Application WO/2022/050274
Kind Code:
A1
Abstract:
Provided are a highly convenient electronic approval system, electronic approval server, and electronic approval program. An electronic approval system according to an embodiment of the present invention is provided with at least one electronic approval device, and an electronic approval server. The electronic approval device is equipped with a first communication unit, a biometric authentication unit, and a security chip. The electronic approval server is equipped with a second communication unit, and a processor. The first communication unit communicates with the electronic approval server by way of an information processing device. The biometric authentication unit performs biometric authentication. If the result of the biometric authentication is normal, the security chip uses a private key, stored in advance, to create reliability verification information, and transmits the reliability verification information to the electronic approval server by way of the information processing device. The second communication unit communicates with the electronic approval device by way of the information processing device. On the basis of a public key corresponding to the private key, and the reliability verification information, the processor saves an electronic approval record indicating that the approval by the electronic approval device was executed normally.

Inventors:
TOSHIMITSU KIYOSHI (JP)
Application Number:
PCT/JP2021/031942
Publication Date:
March 10, 2022
Filing Date:
August 31, 2021
Export Citation:
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Assignee:
TOSHIBA KK (JP)
TOSHIBA INFRASTRUCTURE SYSTEMS & SOLUTIONS CORP (JP)
International Classes:
G06F21/32; G09C1/00; H04L9/32
Foreign References:
JP2014026311A2014-02-06
JP2018074205A2018-05-10
CN111428218A2020-07-17
JP2004214792A2004-07-29
JP2007066212A2007-03-15
Attorney, Agent or Firm:
KURATA, Masatoshi et al. (JP)
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