Title:
ELECTRONIC MICROSCOPE AND SAMPLE OBSERVATION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/162901
Kind Code:
A1
Abstract:
The present invention is provided with: a secondary electron detector that detects an electron that is generated when an electron beam from an electron gun is applied to a sample (70); a monitor that displays a secondary electron image of the sample on the basis of an output from the detector; a gas introducing apparatus (60) for discharging a gas to the sample (70); and a gas control apparatus (81) that controls the quantity of the gas to be discharged by means of the gas introducing apparatus (60) such that a degree of vacuum in an intermediate chamber having the secondary electron detector disposed therein is held lower than a set value (P1) when discharging the gas by means of the gas introducing apparatus (60). Consequently, a microscope image of the sample disposed in the gas atmosphere can be obtained using the detector to which a voltage is needed to be applied.
Inventors:
NAGAOKI ISAO (JP)
OYAGI TOSHIYUKI (JP)
MATSUMOTO HIROAKI (JP)
NAKANO KIYOTAKA (JP)
SATO TAKESHI (JP)
NAGAKUBO YASUHIRA (JP)
OYAGI TOSHIYUKI (JP)
MATSUMOTO HIROAKI (JP)
NAKANO KIYOTAKA (JP)
SATO TAKESHI (JP)
NAGAKUBO YASUHIRA (JP)
Application Number:
PCT/JP2014/057874
Publication Date:
October 09, 2014
Filing Date:
March 20, 2014
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/20; H01J37/16; H01J37/28
Foreign References:
| JPH10134751A | 1998-05-22 | |||
| JP2002083564A | 2002-03-22 | |||
| JP2007214088A | 2007-08-23 | |||
| JP2009099468A | 2009-05-07 | |||
| JP2004335242A | 2004-11-25 | |||
| JP2000241372A | 2000-09-08 |
Attorney, Agent or Firm:
KAICHI IP (JP)
Patent business corporation development-of-knowledge international patent firm (JP)
Patent business corporation development-of-knowledge international patent firm (JP)
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