Title:
ELECTROSTATIC CHUCK, ELECTROSTATIC CHUCK HEATER COMPRISING SAME, AND SEMICONDUCTOR HOLDING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/277559
Kind Code:
A1
Abstract:
An electrostatic chuck is provided. Implemented according to an embodiment of the present invention is an electrostatic chuck comprising: a silicon nitride sintered body; a silicon carbide (SiC) surface modification layer covering at least a portion of the external surface of the silicon nitride sintered body and having corrosion resistance and plasma resistance; and an electrostatic electrode laid inside the silicon nitride sintered body. Therefore, the electrostatic chuck includes a ceramic sintered body of silicon nitride, and thus has excellent plasma resistance, chemical resistance, and thermal shock resistance while exhibiting an equivalent or similar level of heat dissipation performance compared to ceramic sintered bodies of aluminum nitride that have been conventionally widely used, so that the electrostatic chuck can be widely used in semiconductor processes.
More Like This:
| JPH056933 | ELECTROSTATIC CHUCK MADE OF CERAMIC |
| WO/2014/067667 | THERMALLY DEBONDABLE TAPE |
| JP4666903 | Wafer support member |
Inventors:
LEE JI HYUNG (KR)
Application Number:
PCT/KR2022/009287
Publication Date:
January 05, 2023
Filing Date:
June 29, 2022
Export Citation:
Assignee:
AMOSENSE CO LTD (KR)
International Classes:
H01L21/683; B23Q3/15; H01L21/67; H01L21/687; H02N13/00; H05B3/14; H05B3/28
Foreign References:
| KR20190142384A | 2019-12-26 | |||
| KR101402234B1 | 2014-05-30 | |||
| JP5751672B2 | 2015-07-22 | |||
| KR20170036740A | 2017-04-03 | |||
| KR20090048449A | 2009-05-13 |
Attorney, Agent or Firm:
ERUUM & LEEON INTELLECTUAL PROPERTY LAW FIRM (KR)
Download PDF: