Title:
EQUIPMENT DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/144874
Kind Code:
A1
Abstract:
This equipment diagnostic device for diagnosing semiconductor processing equipment (plasma processing equipment) executes arithmetic processing using data acquired from semiconductor device manufacturing equipment having a reference chamber to map a feature thereof onto a graph, which has two or more dimensions with a plurality of parameters as axes, and create reference chamber feature map data (D107). The equipment diagnostic device further executes arithmetic processing using data acquired from semiconductor device manufacturing equipment having a correction target chamber to map a feature thereof onto a graph, which has two or more dimensions with a plurality of parameters as axes, and create correction target chamber feature map data (D112). The equipment diagnostic device uses patterns exhibited in the reference chamber feature map data and the correction target chamber feature map data to identify a difference in performance between different chambers, a difference in performance due to a change over time of the same chamber, or a difference in performance due to replacement or cleaning of parts of the same chamber.
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Inventors:
MATSUKURA SATORU (JP)
KAMAJI YOSHITO (TW)
TAMARI NANAKO (JP)
KAGOSHIMA AKIRA (JP)
SUMIYA MASAHIRO (JP)
KAMAJI YOSHITO (TW)
TAMARI NANAKO (JP)
KAGOSHIMA AKIRA (JP)
SUMIYA MASAHIRO (JP)
Application Number:
PCT/JP2022/002602
Publication Date:
August 03, 2023
Filing Date:
January 25, 2022
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/02
Foreign References:
| JP2002270581A | 2002-09-20 | |||
| JP2011238769A | 2011-11-24 | |||
| JP2013135044A | 2013-07-08 | |||
| JP2003077780A | 2003-03-14 | |||
| JP2005109437A | 2005-04-21 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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