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Title:
ESTER COMPOUND-CONTAINING COMPOSITION, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, (METH)ACRYLIC POLYMER, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2024/095957
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: an ester compound-containing composition having excellent storage stability, and a method for producing same; a polymerizable composition; and a (meth)acrylic polymer and a method for producing same.　A methacrylic acid-containing composition contains an ester compound (I) and a component (A). The content of the ester compound (I) is 95.00-99.99 mass% of the total mass.　Ester compound (I): one or more compounds selected from the group consisting of an ester compound (1), an ester compound (2), a compound (3), an ester compound (4) and an ester compound (5).　Component (A): one or more components selected from the group consisting of a component A1, a component A2, a component A6, a component A7, a component A8, a component A9 and a component A10.

Inventors:
AIZAWA RYO (JP)
WATANABE TAKESHI (JP)
ICHII NAOKI (JP)
Application Number:
PCT/JP2023/039088
Publication Date:
May 10, 2024
Filing Date:
October 30, 2023
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
C08F20/18; C07C67/03; C07C69/54; C08F20/10
Domestic Patent References:
WO2011049138A12011-04-28
WO2020174787A12020-09-03
WO2012018007A12012-02-09
WO2022219969A12022-10-20
WO2022185715A12022-09-09
WO2015119233A12015-08-13
WO2022158190A12022-07-28
WO2022230596A12022-11-03
WO2022230913A12022-11-03
WO2022230914A12022-11-03
WO2022230915A12022-11-03
WO2022230916A12022-11-03
WO2023100867A12023-06-08
Foreign References:
JPS4737929B1
JPS51146418A1976-12-16
JP2021081725A2021-05-27
JP2009274986A2009-11-26
JP2018083896A2018-05-31
JP2021113317A2021-08-05
JP2011506517A2011-03-03
JP2005336139A2005-12-08
JP2022056754A2022-04-11
JP2022066090A2022-04-28
JP2022103861A2022-07-08
JP2019099751A2019-06-24
JP2022134862A2022-09-15
JP2022102363A2022-07-07
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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