ETHYLENIC FLUOROMONOMER CONTAINING HYDROXYL OR FLUOROALKYLCARBONYL GROUP AND FLUOROPOLYMER OBTAINED BY POLYMERIZING THE SAME

Title:

ETHYLENIC FLUOROMONOMER CONTAINING HYDROXYL OR FLUOROALKYLCARBONYL GROUP AND FLUOROPOLYMER OBTAINED BY POLYMERIZING THE SAME

Document Type and Number:

WIPO Patent Application WO/2002/066526

Kind Code:

A1

Abstract:

An ethylenic fluoromonomer containing a hydroxyl or fluoroalkylcarbonyl group which is represented by the formula (1) (1) or formula (14) (14) (wherein X?1¿ and X?2¿ are the same or different and each is hydrogen or fluorine; X?3¿ is hydrogen, fluorine, chlorine, or CF¿3?; Rf?1¿ and Rf?2¿ are the same or different and each is C¿1-20? perfluoroalkyl; Rf?3¿ is C¿1-40? fluoroalkylene or fluoroalkylene which has an ether bond and 1 to 100 carbon atoms and in which the total number of carbon and oxygen atoms is 2 or larger; and a is 0 or 1); a fluoropolymer having structural units derived from the monomer; and a composition for photoresists. The monomer has satisfactory polymerizability, especially radical polymerizability. The polymer obtained by polymerizing the monomer has excellent optical properties and is useful as a base polymer for antireflection films or resist compositions.

Inventors:

ARAKI TAKAYUKI (JP)
KOMATSU YUZO (JP)
KOH MEITEN (JP)

Application Number:

PCT/JP2002/001518

Publication Date:

August 29, 2002

Filing Date:

February 21, 2002

Export Citation:

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Assignee:

DAIKIN IND LTD (JP)
ARAKI TAKAYUKI (JP)
KOMATSU YUZO (JP)
KOH MEITEN (JP)

International Classes:

C07C33/42; C07C43/178; C07C45/45; C07C49/227; C07C49/255; C08F16/04; C08F16/34; C08F216/04; G03F7/004; G03F7/038; G03F7/039; G03F7/09; (IPC1-7): C08F216/04; C08L29/02; C08F214/18; G03F7/039

Domestic Patent References:

WO2000067072A1

2000-11-09

Foreign References:

JP2002090996A	2002-03-27
US3414549A	1968-12-03
US3391119A	1968-07-02
JPH05238988A	1993-09-17

Other References: