Title:
EXAMINATION SYSTEM AND EXAMINATION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/034108
Kind Code:
A1
Abstract:
Provided is an examination system wherein a reaction liquid reference position in a reaction process in which pores are supplied with a reaction liquid is set above the upper surface of a test chip, a cleaning solution reference position in a cleaning process in which pores are supplied with a cleaning solution is set above the reaction liquid reference position, and a control unit carries out control such that during supply of the reaction liquid as a liquid, the supplying operation by a liquid supplying unit is stopped when the surface level of the reaction liquid becomes equal to or higher than the reaction liquid reference position and that during supply of the cleaning solution as the liquid, the supplying operation is stopped when the surface level of the cleaning solution becomes equal to or higher than the cleaning solution reference position.
Inventors:
ITO TAKAAKI (JP)
Application Number:
PCT/JP2017/026704
Publication Date:
February 22, 2018
Filing Date:
July 24, 2017
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G01N33/543; C12M1/00; C12Q1/68; G01F23/292; G01N21/76; G01N33/53
Domestic Patent References:
| WO2011027851A1 | 2011-03-10 |
Foreign References:
| JP2005148048A | 2005-06-09 | |||
| JPH0627111A | 1994-02-04 | |||
| JP2006153889A | 2006-06-15 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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