Title:
EXHAUST GAS PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/111957
Kind Code:
A1
Abstract:
Provided is an exhaust gas processing device comprising: a reaction tower into which exhaust gas is introduced, a liquid for processing the exhaust gas being supplied to the reaction tower; a first jet unit that jets the liquid into the reaction tower; a flow rate control unit that controls the flow rate of the liquid supplied to the reaction tower; an exhaust gas introduction tube that introduces the exhaust gas into the reaction tower; and a spray unit that sprays the liquid that has processed the exhaust gas into the exhaust gas inside the exhaust gas introduction tube or near the exhaust gas introduction tube inside the reaction tower, the flow rate control unit controlling the flow rate of the liquid supplied to the reaction tower on the basis of the pH and/or the total alkalinity of the exhaust liquid.
Inventors:
TAKAHASHI KUNIYUKI (JP)
NODA NAOHIRO (JP)
NODA NAOHIRO (JP)
Application Number:
PCT/JP2020/043907
Publication Date:
June 10, 2021
Filing Date:
November 25, 2020
Export Citation:
Assignee:
FUJI ELECTRIC CO LTD (JP)
International Classes:
B01D53/14; B01D53/18; B01D53/50; B01D53/78; B01D53/92; B63H21/32; F01N3/04; F01N3/08
Domestic Patent References:
| WO2010116482A1 | 2010-10-14 | |||
| WO2016009549A1 | 2016-01-21 | |||
| WO2017002537A1 | 2017-01-05 |
Foreign References:
| JP2018507779A | 2018-03-22 | |||
| JP2019130461A | 2019-08-08 | |||
| JPS6271516A | 1987-04-02 | |||
| JPH09166315A | 1997-06-24 | |||
| JPH06285326A | 1994-10-11 | |||
| JP2010115602A | 2010-05-27 | |||
| JPS5465940U | 1979-05-10 | |||
| JP2000317241A | 2000-11-21 | |||
| JPS56136617A | 1981-10-26 | |||
| JPH10314537A | 1998-12-02 | |||
| JP2010260894A | 2010-11-18 | |||
| JPH0686911B2 | 1994-11-02 | |||
| JP6188033B2 | 2017-08-30 |
Other References:
See also references of EP 3964278A4
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
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