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Patent Searching and Data


Title:
EXHAUST GAS TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/018957
Kind Code:
A1
Abstract:
Provided is an exhaust gas treatment device comprising: a reaction tower that has an exhaust gas introduction port into which exhaust gas is introduced and an exhaust gas discharge port from which exhaust gas is discharged, wherein a liquid for treating exhaust gas is supplied to the reaction tower; and one or a plurality of swiveling parts for swiveling exhaust gas, the swiveling part(s) being provided inside the reaction tower and being provided between the exhaust gas introduction port and the exhaust gas discharge port, wherein the swiveling part has an outer cylinder and a spiral plate which is provided at the cavity part inside the outer cylinder and which is formed by spirally twisting a flat plate, and the length of one side of the flat plate is equal to the width of the cavity part in the direction intersecting the extending direction of the outer cylinder.

Inventors:
ENAMI YOSHIAKI (JP)
Application Number:
PCT/JP2021/019630
Publication Date:
January 27, 2022
Filing Date:
May 24, 2021
Export Citation:
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Assignee:
FUJI ELECTRIC CO LTD (JP)
International Classes:
B01D53/18; B01D53/50; B01D53/78; B01D53/92; F01N3/04; F01N3/24
Foreign References:
JP2001187313A2001-07-10
JP2014500790A2014-01-16
JP2017012951A2017-01-19
KR20100137220A2010-12-30
JP2018140328A2018-09-13
JP2010043969A2010-02-25
Other References:
See also references of EP 4066920A4
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
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