Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
EXPOSURE APPARATUS AND METHOD, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/055199
Kind Code:
A1
Abstract:
Disclosed is an exposure apparatus (EX) comprising an optical system (PL) having a plurality of optical members respectively arranged opposite to a substrate (P) and through each of which an exposure light (EL) passes, and a liquid immersion system (1) for filling spaces between the respective optical members and the substrate (P) with a liquid (LQ). The substrate (P) is exposed through at least a part of the optical members and the liquid (LQ).

More Like This:
WO/1998/048451ALIGNER, EXPOSURE METHOD USING THE ALIGNER, AND METHOD OF MANUFACTURE OF CIRCUIT DEVICE
JP2010522953Radioactive source for generating electromagnetic radiation and method of generating electromagnetic radiation
JP3836826LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURING METHOD
Inventors:
NAGASAKA HIROYUKI (JP)
Application Number:
PCT/JP2006/322168
Publication Date:
May 18, 2007
Filing Date:
November 07, 2006
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORP (JP)
NAGASAKA HIROYUKI (JP)
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
WO1999049504A11999-09-30
WO1999028790A11999-06-10
WO2004055803A12004-07-01
WO2004057590A12004-07-08
WO2005029559A12005-03-31
WO2004086468A12004-10-07
WO2005059617A22005-06-30
WO2005059618A22005-06-30
WO2004090956A12004-10-21
WO1999046835A11999-09-16
WO1999023692A11999-05-14
WO2001035168A12001-05-17
Foreign References:
US20050243298A12005-11-03
JP2005236291A2005-09-02
JP2005077533A2005-03-24
JP2005019864A2005-01-20
JP2003203853A2003-07-18
JP2001337463A2001-12-07
JP2005324618A2005-11-24
JP2000260684A2000-09-22
US6781672B22004-08-24
JPH08130179A1996-05-21
US6721034B12004-04-13
JP2004289126A2004-10-14
US20040165159A12004-08-26
EP1420298A22004-05-19
US20050280791A12005-12-22
US6952253B22005-10-04
US20060023188A12006-02-02
US7023610B22006-04-04
JPH10163099A1998-06-19
JPH10214783A1998-08-11
US6590634B12003-07-08
JP2000505958A2000-05-16
US5969441A1999-10-19
US6208407B12001-03-27
JPH11135400A1999-05-21
JP2000164504A2000-06-16
US6897963B12005-05-24
JPH06124873A1994-05-06
JPH10303114A1998-11-13
US5825043A1998-10-20
US6778257B22004-08-17
JP2004519850A2004-07-02
US6611316B22003-08-26
Attorney, Agent or Firm:
SHIGA, Masatake et al. (Yaesu Chuo-k, Tokyo 53, JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: NEGATIVE ELECTRODE FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY

Next Patent: DRAW-IN MECHANISM