Title:
EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/282205
Kind Code:
A1
Abstract:
The present invention is an exposure device which exposes, in order to enhance throughput of the exposure device, an object to patterned light generated by a spatial light modulator according to drawing data, the exposure device comprising: an illumination optical system which irradiates illumination light at the spatial light modulator; a projection optical system which projects the patterned light at the object; a first moving body which is disposed below the projection optical system and holds the object; a first drive unit which moves the first moving body in a first direction and a second direction which are orthogonal to each other within a prescribed plane which is orthogonal to an optical axis of the projection optical system; a second moving body which holds the spatial light modulator; a second drive unit which moves the second moving body; a measurement unit which obtains at least one of position information of the object and position information of the first moving body as a measurement result; and a control unit which controls the exposure position of the patterned light by controlling, on the basis of the measurement result obtained by the measurement unit, at least one of driving of the second moving body and adjustment of the projection optical system.
Inventors:
KATO MASAKI (JP)
MIZUNO HITOSHI (JP)
MIZUNO YASUSHI (JP)
MIZUNO HITOSHI (JP)
MIZUNO YASUSHI (JP)
Application Number:
PCT/JP2022/026485
Publication Date:
January 12, 2023
Filing Date:
July 01, 2022
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20
Foreign References:
| JP2010533310A | 2010-10-21 | |||
| JP2013012639A | 2013-01-17 | |||
| JP2008182115A | 2008-08-07 | |||
| JP2002050558A | 2002-02-15 | |||
| JP2004056080A | 2004-02-19 |
Attorney, Agent or Firm:
KATAYAMA, Shuhei (JP)
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