Title:
EXPOSURE DEVICE AND MEASUREMENT SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/286732
Kind Code:
A1
Abstract:
In order to improve the throughput in wiring pattern formation for FO-WLP, this exposure device is equipped with: a substrate stage on which a plurality of substrates are placed; and a plurality of first projection modules that each have a spatial light modulator and project, onto the plurality of substrates, a wiring pattern for connecting a plurality of semiconductor chips arranged on each of the plurality of substrates. The plurality of first projection modules project individual wiring patterns onto different substrates at approximately the same time.
Inventors:
KATO MASAKI (JP)
MIZUNO YASUSHI (JP)
MIZUNO YASUSHI (JP)
Application Number:
PCT/JP2022/027236
Publication Date:
January 19, 2023
Filing Date:
July 11, 2022
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F9/00; G03F7/20
Foreign References:
| JP2013058520A | 2013-03-28 | |||
| US20150077731A1 | 2015-03-19 | |||
| JP2021085981A | 2021-06-03 | |||
| JP2020140070A | 2020-09-03 | |||
| CN109270809A | 2019-01-25 |
Attorney, Agent or Firm:
KATAYAMA, Shuhei (JP)
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