Title:
EXPOSURE MACHINE AND SUBSTRATE TRANSFER METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/057114
Kind Code:
A1
Abstract:
An exposure machine, comprising a stage part (101), a port part (104) and a transfer mechanism; the stage part (101) comprises a working table and a sheet holder, the sheet holder being located on the working table for placing a tray (102); the port part (104) serves as a feed port and a discharge port of the exposure machine; and the transfer mechanism comprises an upper arm (107), a lower arm (108) and a movable tray guide rail (109), the tray guide rail (109) connecting the stage part (101) and the port part (104), the lower arm (108) being provided with a hook (110) for hooking the tray (102) and moving the tray (102) to the port part (104).
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Inventors:
WANG WEI (CN)
Application Number:
PCT/CN2019/082629
Publication Date:
March 26, 2020
Filing Date:
April 15, 2019
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
B65H5/08
Foreign References:
| CN207424530U | 2018-05-29 | |||
| CN109384062A | 2019-02-26 | |||
| JP2018031824A | 2018-03-01 | |||
| CN206569713U | 2017-10-20 | |||
| CN106371292A | 2017-02-01 | |||
| KR20080013658A | 2008-02-13 | |||
| JP6172913B2 | 2017-08-02 | |||
| CN2037874U | 1989-05-17 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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