Title:
EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2021/065753
Kind Code:
A1
Abstract:
In order to provide an exposure method with which it is possible to connect a plurality of shot areas with high precision and reduce the size of the device used, an exposure method according to the present invention is characterized by including a step for exposing a first shot area on a substrate so that the illuminance of an illuminated area at a prescribed time when a first connected area included in the first shot area passes through the illuminated area differs from the illuminance when a first non-connected area included in the first shot area passes through the illuminated area, and a step for exposing a second shot area arranged in a scanning direction with respect to the first shot area so that the illuminance at a prescribed time when a second connected area included in the second shot area and overlapping the first connected area passes through the illuminated area differs from the illuminance when a second non-connected area included in the second shot area passes through the illuminated area.
Inventors:
KONO MICHIO (JP)
Application Number:
PCT/JP2020/036465
Publication Date:
April 08, 2021
Filing Date:
September 25, 2020
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
G03F7/20
Foreign References:
| JP2017026768A | 2017-02-02 | |||
| JP2007073984A | 2007-03-22 | |||
| JP2002353108A | 2002-12-06 | |||
| JP2004335864A | 2004-11-25 | |||
| JP2017053888A | 2017-03-16 | |||
| JP2017032655A | 2017-02-09 |
Attorney, Agent or Firm:
OKABE Yuzuru et al. (JP)
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