EXPOSURE SYSTEM AND PRODUCTION METHOD FOR EXPOSURE SYSTEM

WIPO Patent Application WO/2004/033216

A1

An exposure system capable of determining the correction values of respective light emitting units by means of a method of detecting a light quantity corresponding to one light emitting unit out of a composite light containing an adjoining light, and a production method for producing such an exposure system. The production method is characterized by comprising the step of lighting a plurality of light emitting units simultaneously, the step of detecting the output light quantity distribution of a plurality of all the light emitting units by measuring using a line-form light receiving element, the step of respectively detecting peak positions corresponding to respective light emitting units using the output light quantity distribution, the step of detecting the light quantities of respective light emitting elements based on respective peak positions, and the step of respectively determining correction values for correcting unevenness in light quantities at respective light emitting units based on the light quantities of respective light emitting units.

SHIOTA AKIRA (JP)
YASUNAGA MAKOTO (JP)
MASUBUCHI SADAO (JP)
IWAKO AKINOBU (JP)
YOKOYAMA MASAFUMI (JP)

PCT/JP2003/013087

April 22, 2004

October 10, 2003

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CITIZEN WATCH CO LTD (JP)
SHIOTA AKIRA (JP)
YASUNAGA MAKOTO (JP)
MASUBUCHI SADAO (JP)
IWAKO AKINOBU (JP)
YOKOYAMA MASAFUMI (JP)

B41J2/45; G06K15/12; (IPC1-7): B41J2/445

JP2001138568A	2001-05-22
US20010040676A1	2001-11-15
JP2001267636A	2001-09-28

Aoki, Atsushi (ISHIDA & ASSOCIATES Toranomon 37 Mori Bldg., 5-1, Toranomon 3-chom, Minato-ku Tokyo, JP)

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