Title:
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/179417
Kind Code:
A1
Abstract:
This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror positioned inside of the chamber; and a hydrogen gas discharge section positioned inside of the chamber, said hydrogen gas discharge section having an opening configured so as to discharge hydrogen gas from the periphery of the EUV light collecting mirror toward the inner side, and a first cooling medium flow channel configured so as to pass a cooling medium.
Inventors:
UEDA ATSUSHI (JP)
TAKAYAMA AKIHIRO (JP)
TAKAYAMA AKIHIRO (JP)
Application Number:
PCT/JP2017/013816
Publication Date:
October 04, 2018
Filing Date:
March 31, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00; G03F7/20
Foreign References:
| JP2013135033A | 2013-07-08 | |||
| JP2013004369A | 2013-01-07 | |||
| JP2008103206A | 2008-05-01 | |||
| JP2014154616A | 2014-08-25 |
Attorney, Agent or Firm:
HOSAKA Nobuhisa (JP)
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