Title:
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/003284
Kind Code:
A1
Abstract:
An extreme ultraviolet light generation device comprises: a chamber that focuses laser light in the inner space to plasmatize a target substance at the focal point of laser light; a collector mirror that collects extreme ultraviolet light generated by the plasmatized target substance; and a magnetic field generation unit structured to generate a magnetic field to make the charged particles created by the plasmatized target substance converge on the wall of the chamber. The collector mirror includes a substrate, a reflective layer provided on the substrate and reflecting the extreme ultraviolet light, and a protective layer provided on the reflective layer. The protective layer has a layer-thickness distribution in which the layer thickness of the protective layer from the surface of the reflective layer changes. The position of the maximum layer thickness on the protective layer may be on a line (CL) where a plane passing through the magnetic field axis of the magnetic field generation unit and the center axis (CA) of the collector mirror and the surface (62F) of the reflective layer intersect with each other.
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Inventors:
TOMURO HIROAKI (JP)
NAGAI SHINJI (JP)
HONDA YOSHIYUKI (JP)
NAGAI SHINJI (JP)
HONDA YOSHIYUKI (JP)
Application Number:
PCT/JP2017/023455
Publication Date:
January 03, 2019
Filing Date:
June 26, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H05G2/00
Foreign References:
| JP2017509920A | 2017-04-06 | |||
| JP2014514741A | 2014-06-19 | |||
| JP2006332153A | 2006-12-07 |
Attorney, Agent or Firm:
MORIMURA Yasuo (JP)
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