Title:
EXTREME ULTRAVIOLET LIGHT GENERATOR
Document Type and Number:
WIPO Patent Application WO/2019/043773
Kind Code:
A1
Abstract:
[Problem] To enable easy measurement of the film thickness of debris adhered to the surface of a component without the need for the extensive disassembly of the in-chamber component in an extreme ultraviolet light generator.
[Solution] An extreme ultraviolet light generator (10) comprises: a chamber (5) for generating extreme ultraviolet light by irradiating a droplet comprising a target material with laser light; an EUV light collector mirror (11) that is an optical element arranged in the chamber (5); and measuring equipment (24, 25) that can move along the surface (11S) of the EUV light collector mirror and measures the film thickness of a target material adhered to the surface (11S).
Inventors:
SUGISAWA KATSUHIKO (JP)
Application Number:
PCT/JP2017/030851
Publication Date:
March 07, 2019
Filing Date:
August 29, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H05G2/00
Foreign References:
| JP2006529057A | 2006-12-28 | |||
| JP2014240949A | 2014-12-25 | |||
| JP2009026933A | 2009-02-05 | |||
| JP2009016640A | 2009-01-22 | |||
| JP2009088439A | 2009-04-23 | |||
| JP2011515650A | 2011-05-19 | |||
| JP2011504294A | 2011-02-03 |
Attorney, Agent or Firm:
MATSUURA, Kenzo (JP)
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