Title:
EXTREME-ULTRAVIOLET LIGHT SOURCE DEVICE USING ELECTRON BEAMS
Document Type and Number:
WIPO Patent Application WO/2021/182887
Kind Code:
A2
Abstract:
An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitter located on the cathode electrode and comprising a carbon-based material; and a gate electrode which is located on the plurality of emitters with a distance therefrom and to which a pulse voltage is applied.
Inventors:
PARK KYU CHANG (KR)
Application Number:
PCT/KR2021/003021
Publication Date:
September 16, 2021
Filing Date:
March 11, 2021
Export Citation:
Assignee:
UNIV INDUSTRY COOPERATION GROUP KYUNG HEE UNIV (KR)
International Classes:
H05G2/00
Attorney, Agent or Firm:
OH, Se Joong (KR)
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