Title:
EXTREME UV LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/138918
Kind Code:
A1
Abstract:
The extreme UV light generation device according to one aspect of the present disclosure comprises a chamber; a target supply unit which supplies droplets of a target substance into a plasma generation region inside the chamber; a first pipe which encloses at least part of a range of a trajectory of the droplets, wherein a first end part, which is an upstream end part in the trajectory direction, and a second end part, which is a downstream end part, are open; a second pipe which encloses at least part of a range of the first pipe and is disposed across a gap from part of the first pipe, in which a third end part, which is a downstream end part in the trajectory direction, is open, the third end part extending further downstream in the trajectory direction than the second end part of the first pipe; and a gas supply unit which supplies gas that flows through the gap between the first pipe and the second pipe, and causes gas to flow in the trajectory direction from a gas outlet formed in the second end-side of the gap.
Inventors:
ISHIHARA TAKANOBU (JP)
NISHISAKA TOSHIHIRO (JP)
SHIRAISHI YUTAKA (JP)
NISHISAKA TOSHIHIRO (JP)
SHIRAISHI YUTAKA (JP)
Application Number:
PCT/JP2017/003211
Publication Date:
August 02, 2018
Filing Date:
January 30, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00; G03F7/20
Domestic Patent References:
| WO2015099058A1 | 2015-07-02 |
Foreign References:
| JP2015509646A | 2015-03-30 | |||
| JP2013516773A | 2013-05-13 | |||
| JP2013526026A | 2013-06-20 | |||
| JP2006086119A | 2006-03-30 |
Attorney, Agent or Firm:
MATSUURA, Kenzo (JP)
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