Title:
EXTREME UV LIGHT GENERATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/220761
Kind Code:
A1
Abstract:
An extreme UV light generation system may comprise: a first area that includes a light path adjustment unit that adjusts the light path of laser light emitted from an oscillator; a second area that includes a chamber having a plasma generation region in the interior thereof; a first interlock switch disposed in the first area; a second interlock switch disposed in the second area; and a control unit configured so as to be able to switch between a first setting state in which monitoring of detection signals output from both the first interlock switch and the second interlock switch is set to be enabled, a second setting state in which monitoring of detection signals output from both the first interlock switch and the second interlock switch is set to be disabled, and a third setting state in which monitoring of detection signals output from the first interlock switch is set to be enabled and monitoring of detection signals output from the second interlock switch is set to be disabled.
Inventors:
HAYASHI KENGO (JP)
Application Number:
PCT/JP2017/020321
Publication Date:
December 06, 2018
Filing Date:
May 31, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H05G2/00
Domestic Patent References:
| WO2011074649A1 | 2011-06-23 |
Foreign References:
| JP2005175125A | 2005-06-30 | |||
| JPH11186131A | 1999-07-09 | |||
| JP2009188128A | 2009-08-20 |
Attorney, Agent or Firm:
MORIMURA Yasuo (JP)
Download PDF: