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Patent Searching and Data


Title:
FABRIC HAVING CUT-LOOP STRUCTURE, METHOD FOR MANUFACTURING SAME, AND PRODUCT USING FABRIC HAVING CUT-LOOP STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2014/046366
Kind Code:
A1
Abstract:
The present invention provides fabric having a cut-loop structure and a method for manufacturing same, wherein a center thread of a cut portion of a loop in the fabric protrudes out of covering threads, wherein the center thread which is made from a mono filament yarn is separated into a plurality of filaments. In the fabric having the cut-loop structure, the mono filament yarn that is the center thread functions like a hook which easily captures and wipes impurities, such as ultra particulate matter and hair, and provides superior wiping, sliding, water-absorbing, and quick drying properties as well as a nice tactile sensation due to the covering thread made from split microfiber, which comprises polyester and nylon, and viscose rayon thread. As a result, the fabric having the cut-loop structure according to the present invention can be useful in kitchen towels, rags, and products including various mats, towels, and bath products.

Inventors:
LEE HYUN SAM (KR)
CHOI SUNG HOON (KR)
Application Number:
PCT/KR2013/003851
Publication Date:
March 27, 2014
Filing Date:
May 03, 2013
Export Citation:
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Assignee:
CLEMBON CO LTD (KR)
International Classes:
D03D27/00; D02G3/36; D06B13/00; D06C11/00
Foreign References:
KR100716623B12007-05-09
KR20110007037A2011-01-21
KR200453566Y12011-05-12
KR19990015109A1999-03-05
Attorney, Agent or Firm:
DARAE IP FIRM (KR)
특허법인 다래 (KR)
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