Title:
FACIAL PATCH
Document Type and Number:
WIPO Patent Application WO/2014/097422
Kind Code:
A1
Abstract:
Provided is a facial patch which comprises a support, an adhesive layer and a release layer in that order, characterized in that (a) the adhesive layer (a-1) comprises a styrene-isoprene-styrene-block copolymer, a tackifying resin and a softner, (a-2) has a ratio (mass ratio) of the styrene-isoprene-styrene-block copolymer to the tackifying resin of 1:2 to 1:4, and (a-3) contains the softner in an amount of 40 to 60 mass%, and (b) the support has an elastic modulus (Young's modulus) of 0.01 to 0.5 GPa. Also provided is a method for manufacturing the facial patch which includes a step of forming an adhesive layer on the top face of the release layer.
Inventors:
KAWAHARA KOJI (JP)
HIRAOKA TAKAO (JP)
TANAKA MARIKO (JP)
KENMOCHI CHIHIRO (JP)
HIRAOKA TAKAO (JP)
TANAKA MARIKO (JP)
KENMOCHI CHIHIRO (JP)
Application Number:
PCT/JP2012/082908
Publication Date:
June 26, 2014
Filing Date:
December 19, 2012
Export Citation:
Assignee:
NICHIBAN KK (JP)
International Classes:
A61F13/12
Domestic Patent References:
| WO2009041122A1 | 2009-04-02 | |||
| WO2006092829A1 | 2006-09-08 |
Foreign References:
| JP2005154414A | 2005-06-16 | |||
| JP2001328935A | 2001-11-27 | |||
| JP2006008593A | 2006-01-12 | |||
| JP2007215578A | 2007-08-30 | |||
| JP2000513347A | 2000-10-10 | |||
| JPH0517346A | 1993-01-26 |
Other References:
See also references of EP 2937066A4
Attorney, Agent or Firm:
NOMURA Yasuhide et al. (JP)
Yasuhide Nomura (JP)
Yasuhide Nomura (JP)
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