Title:
FE-PT FERROMAGNETIC SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2012/086578
Kind Code:
A1
Abstract:
A ferromagnetic sputtering target the composition of which is 5 to 50 mol% of Pt, 5 to 15 mol% of SiO2, 0.05 to 0.60 mol% of Sn, and Fe as the balance, wherein the above-mentioned Sn is contained in SiO2 particles (B) dispersed in a metal base (A). A non-magnetic particle dispersion-type ferromagnetic sputtering target is obtained that can control abnormal discharge of the oxide that is the source of particle generation during sputtering.
Inventors:
IKEDA YUKI (JP)
TAKAMI HIDEO (JP)
TAKAMI HIDEO (JP)
Application Number:
PCT/JP2011/079327
Publication Date:
June 28, 2012
Filing Date:
December 19, 2011
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
IKEDA YUKI (JP)
TAKAMI HIDEO (JP)
IKEDA YUKI (JP)
TAKAMI HIDEO (JP)
International Classes:
C23C14/34; B22F3/14; C22C1/05; C22C5/04; C22C32/00; C22C33/02; C22C38/00; G11B5/64; G11B5/851
Foreign References:
| JP2003313659A | 2003-11-06 | |||
| JP2006161082A | 2006-06-22 | |||
| JP2008059733A | 2008-03-13 | |||
| JP2000306228A | 2000-11-02 | |||
| JP2011208167A | 2011-10-20 |
Attorney, Agent or Firm:
OGOSHI ISAMU (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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Claims: