Title:
FERROMAGNETIC MATERIAL SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2012/029331
Kind Code:
A1
Abstract:
Disclosed is a ferromagnetic material sputtering target which is a sintered body sputtering target that is composed of a metal mainly composed of Co and non-metallic inorganic material particles. The ferromagnetic material sputtering target is characterized in that there are a plurality of metal phases having different saturation magnetizations and non-metallic inorganic material particles are dispersed in each metal phase. The objective of the present invention is to provide a ferromagnetic material sputtering target which is used for the formation of a magnetic thin film of a magnetic recording medium, especially for the formation of a magnetic recording layer of a hard disk that utilizes perpendicular magnetic recording system, said ferromagnetic material sputtering target being capable of achieving stable discharge and also being capable of suppressing generation of particles during the sputtering, while achieving stable discharge in a magnetron sputtering apparatus by increasing the leakage magnetic flux of the sputtering target.
Inventors:
SATO ATSUSHI (JP)
TAKAMI HIDEO (JP)
TAKAMI HIDEO (JP)
Application Number:
PCT/JP2011/051775
Publication Date:
March 08, 2012
Filing Date:
January 28, 2011
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
SATO ATSUSHI (JP)
TAKAMI HIDEO (JP)
SATO ATSUSHI (JP)
TAKAMI HIDEO (JP)
International Classes:
C23C14/34; B22F1/10; C22C32/00; G11B5/851; H01F10/16; H01F41/18
Domestic Patent References:
| WO2010007980A1 | 2010-01-21 |
Foreign References:
| JP2009001860A | 2009-01-08 | |||
| JP2008274401A | 2008-11-13 |
Attorney, Agent or Firm:
OGOSHI ISAMU (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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Claims: