FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME

WIPO Patent Application WO/2011/102077

A1

Disclosed is a method for using a field-emission electron source more stably by employing the characteristics of how a current emitted from the (310) surface of W attenuates. The disclosed charged-particle-beam device includes: a field-emission electron source (1) consisting of a <310> single crystal of tungsten; a vacuum chamber (2) in which the electron source is arranged; an exhaust system (11) that exhausts gas from the vacuum chamber; a filament (6) that is connected to the electron source and through which a current is passed to heat the electron source; a power source (7) that feeds a current through the filament; an ammeter (8) that measures the total current amount emitted from the electron source; and a controlling section (4) that measures the total current amount periodically and that controls the power source in a manner such that the power source feeds a current to the filament when the total current amount becomes equal to or less than a predetermined ratio of the total current amount from the electron source found immediately after the initial electron-beam emission or the total current amount from the electron source found immediately after the passage of a current through the filament.

CHO BOKLAE (JP)
KOKUBO SHIGERU (JP)
MURAKOSHI HISAYA (JP)
NITTA HISAO (JP)

PCT/JP2011/000233

August 25, 2011

January 19, 2011

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HITACHI HIGH TECH CORP (JP)
CHO BOKLAE (JP)
KOKUBO SHIGERU (JP)
MURAKOSHI HISAYA (JP)
NITTA HISAO (JP)

H01J37/073; H01J37/18

WO2009153939A1

2009-12-23

JP2008140623A	2008-06-19
JPH11111205A	1999-04-23
JP2009004112A	2009-01-08
JP2009187938A	2009-08-20
JP2007073521A	2007-03-22
JPS5246756A	1977-04-13

INOUE, Manabu et al. (JP)
Manabu Inoue (JP)

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