Title:
FILM EXPOSURE DEVICE AND FILM EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2012/032904
Kind Code:
A1
Abstract:
In the present invention, a laterally situated exposure material membrane is formed in one or both of film base material feeding areas which are on both sides of the cross-wise direction of a film base material (20). An alignment mark forming area (14) forms an alignment mark (2a) by irradiation of exposure light. This alignment mark (2a) is used to detect meandering of the film and to adjust the position of a mask (12). Thus, this film exposure device and film exposure method, capable of easily forming the alignment mark during continuous exposure of film, of correcting film meandering with a high degree of precision, and of exposing film with stability, are obtained.
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Inventors:
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2011/068575
Publication Date:
March 15, 2012
Filing Date:
August 16, 2011
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
MIZUMURA MICHINOBU (JP)
MIZUMURA MICHINOBU (JP)
International Classes:
G03F9/00; G03F7/20; H01L21/677; H01L21/68
Foreign References:
| JP2007310209A | 2007-11-29 | |||
| JPH01295261A | 1989-11-28 | |||
| JP2009276522A | 2009-11-26 | |||
| JP2009053383A | 2009-03-12 | |||
| JP2005316411A | 2005-11-10 | |||
| JP2001060008A | 2001-03-06 |
Attorney, Agent or Firm:
FUJIMAKI, MASANORI (JP)
Masanori Fujimaki (JP)
Masanori Fujimaki (JP)
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