Title:
FILM FORMATION DEVICE, FILM FORMATION METHOD, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/172003
Kind Code:
A1
Abstract:
[Problem] To provide an advantageous technique for keeping an exposure region of a substrate within the depth of focus (DOF) of an exposure device. [Solution] This film formation device, which irradiates a composition on a substrate with light to form a film of the composition atop the substrate, comprises: a light modulation unit that forms a distribution of an integrated light quantity of light on the substrate; and a control unit for controlling the light modulation unit. The control unit controls the distribution of the integrated light quantity of the light modulation unit on the basis of: the residual film ratio characteristics of the composition; and at least one of the curved shape of an imaging plane of a mold used in a subsequent step and the surface shape of a base film formed on the substrate.
Inventors:
KUROSAWA HIROSHI (JP)
ITO TOSHIKI (JP)
ITO TOSHIKI (JP)
Application Number:
PCT/JP2021/004765
Publication Date:
September 02, 2021
Filing Date:
February 09, 2021
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
G03F7/20
Foreign References:
| JP2013171984A | 2013-09-02 | |||
| JP2001144009A | 2001-05-25 | |||
| JP2008134614A | 2008-06-12 | |||
| JP2014066870A | 2014-04-17 | |||
| JP2011066087A | 2011-03-31 | |||
| JP2007140166A | 2007-06-07 |
Attorney, Agent or Firm:
TAKAOKA, Ryoichi et al. (JP)
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