Title:
FILM FORMATION DEVICE AND FILM FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/070473
Kind Code:
A1
Abstract:
A film formation device according to the present invention is provided with: a film formation source which discharges a film formation material toward a substrate through a mask located between the film formation source and a film-forming surface of the substrate; a restricting plate which is arranged between the film formation source and the mask and restricts a region through which the film formation material enters the substrate; and a restricting plate transfer means which transfers the restricting plate relatively to the film formation source in a direction along the film-forming surface.
Inventors:
ICHIHARA MASAHIRO (JP)
Application Number:
PCT/JP2023/031805
Publication Date:
April 04, 2024
Filing Date:
August 31, 2023
Export Citation:
Assignee:
CANON TOKKI CORP (JP)
International Classes:
C23C14/04; C23C14/24; H05B33/10; H10K50/10
Domestic Patent References:
| WO2019187162A1 | 2019-10-03 |
Foreign References:
| JP2019189901A | 2019-10-31 | |||
| JP2019178370A | 2019-10-17 | |||
| JP2006070330A | 2006-03-16 | |||
| JP2015034308A | 2015-02-19 | |||
| JP2007277645A | 2007-10-25 |
Attorney, Agent or Firm:
OHTSUKA PATENT OFFICE, P.C. (JP)
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