Title:
FILM FORMATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/062946
Kind Code:
A1
Abstract:
This film formation device (100) comprises a chamber (1), a mounting stand (21), and a fluid bed (3). The fluid bed (3) is provided to a position, within the chamber (1), that faces a first main surface of a substrate (W) that is mounted on the mounting stand (21). The fluid bed (3) has a plasma chamber (4b), a plasma source (5), a plurality of first outflow ports (4c), a gas flow path (6b), and a plurality of second outflow ports (6c). The plasma source (5) turns a first raw-material gas into plasma in the plasma chamber (4b). The first outflow ports (4c) are arranged in a two-dimensional array in an overlapping region that overlaps the first main surface of the substrate W as seen in plan view. An active species that is derived from the first raw-material gas flows from the first outflow ports (4c) toward the first main surface of the substrate W. The plurality of second outflow ports (6c) are arranged in a two-dimensional array at different positions than the plurality of first outflow ports (4c) in the overlapping region. A second raw-material gas flows from the plurality of second outflow ports (6c) toward the first main surface of the substrate W.
Inventors:
MIYAGI MASAHIRO (JP)
INABA MASAKI (JP)
INABA MASAKI (JP)
Application Number:
PCT/JP2023/032814
Publication Date:
March 28, 2024
Filing Date:
September 08, 2023
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/205; C23C16/455; C23C16/509; H01L21/31; H05H1/46
Foreign References:
| JP2013125761A | 2013-06-24 | |||
| JP2017147204A | 2017-08-24 | |||
| JP2011222592A | 2011-11-04 | |||
| KR20110109216A | 2011-10-06 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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