Title:
FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SURFACE-TREATED METAL MEMBER, AND METHOD FOR PRODUCING METAL-RESIN COMPOSITE
Document Type and Number:
WIPO Patent Application WO/2018/207443
Kind Code:
A1
Abstract:
This film-forming composition contains: an aromatic compound having an amino group and an aromatic ring in one molecule; and a thio compound (not including sulfur oxo-acids having a pKa of -1.9 or less and salts thereof). The pH of the film-forming composition is preferably 4-10. The thio compound is preferably one that ionizes in a solution to form anions, and thiosulfate and thiocyanate are especially preferable. By bringing the film-forming composition into contact with the surface of a metal member, a film is formed on the surface of the metal member, and a surface-treated metal member can be obtained.
Inventors:
TOMATSU ITSURO (JP)
KUMAZAKI KOSUKE (JP)
AMITANI YASUTAKA (JP)
SHIBANUMA YUKO (JP)
KATAYAMA IKUYO (JP)
KUMAZAKI KOSUKE (JP)
AMITANI YASUTAKA (JP)
SHIBANUMA YUKO (JP)
KATAYAMA IKUYO (JP)
Application Number:
PCT/JP2018/008188
Publication Date:
November 15, 2018
Filing Date:
March 02, 2018
Export Citation:
Assignee:
MEC CO LTD (JP)
International Classes:
C23C26/00; B32B15/08; C09D5/00; C09D201/02; C23C22/06; C23C22/63; C23C22/68; H05K3/38
Domestic Patent References:
| WO2009110364A1 | 2009-09-11 | |||
| WO2007093284A1 | 2007-08-23 | |||
| WO2013186941A1 | 2013-12-19 |
Foreign References:
| JP2000073181A | 2000-03-07 | |||
| JP2005060754A | 2005-03-10 | |||
| JP2000286546A | 2000-10-13 | |||
| JP2015214743A | 2015-12-03 | |||
| JPH07258870A | 1995-10-09 | |||
| JP2016056449A | 2016-04-21 | |||
| JP2016037457A | 2016-03-22 |
Other References:
See also references of EP 3636802A4
Attorney, Agent or Firm:
SHINTAKU, Masato et al. (JP)
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