Title:
FILM-FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2021/201167
Kind Code:
A1
Abstract:
[Problem] To provide a film-forming composition for forming a resist underlayer film for a solvent development type resist that is capable of forming a good resist pattern. [Solution] A film-forming composition which contains a hydrolysis-condensation product of a hydrolyzable silane compound, at least one substance that is selected from the group consisting of an aminoplast crosslinking agent and a phenoplast crosslinking agent, and a solvent, and which is characterized in that the hydrolyzable silane compound contains a hydrolyzable silane represented by formula (1).
Inventors:
KATO KODAI (JP)
TAKEDA SATOSHI (JP)
SHIGAKI SHUHEI (JP)
SHIBAYAMA WATARU (JP)
NAKAJIMA MAKOTO (JP)
TAKEDA SATOSHI (JP)
SHIGAKI SHUHEI (JP)
SHIBAYAMA WATARU (JP)
NAKAJIMA MAKOTO (JP)
Application Number:
PCT/JP2021/014019
Publication Date:
October 07, 2021
Filing Date:
March 31, 2021
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08G77/14; C08K5/05; C08K5/06; C08K5/19; C08K5/34; C08K5/42; C08K5/49; C08K5/50; C08L83/04; G03F7/11; G03F7/26; H01L21/027
Domestic Patent References:
| WO2019124514A1 | 2019-06-27 | |||
| WO2016080217A1 | 2016-05-26 |
Foreign References:
| JP2005018054A | 2005-01-20 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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